Granted Patent
Utility
US 6,395,455 · App. 09/903,195
Low thermal distortion Extreme-UV lithography reticle and method
Inventors:
Steven Gianoulakis, Avijit K. Ray-Chaudhuri
Patented Case
View Patent ↗
Granted: May 28, 2002
Filed: Jul 10, 2001
Inventors
Steven Gianoulakis
Avijit K. Ray-Chaudhuri
Assignee (at issue)
EUV LLC.
This patent predates the USPTO's electronic file wrapper — prosecution documents from this era exist only in the Patent Office's paper records. A certified copy of the file history can be ordered from the USPTO's paper archives.