Granted Patent
Utility
US 6,451,620 · App. 09/854,579
Method for etching organic film, method for fabricating semiconductor device and pattern formation method
Inventors:
Hideo Nakagawa, Toshio Hayashi, Yasuhiro Morikawa
Patented Case
View Patent ↗
Granted: Sep 17, 2002
Filed: May 15, 2001
Inventors
Hideo Nakagawa
Toshio Hayashi
Yasuhiro Morikawa
Assignee (at issue)
SUMITOMO ELECTRIC INDUSTRIES, LTD.
This patent predates the USPTO's electronic file wrapper — prosecution documents from this era exist only in the Patent Office's paper records. A certified copy of the file history can be ordered from the USPTO's paper archives.