IP Library › Granted Patent US 6,482,555
Granted Patent Utility
US 6,482,555 · App. 09/976,336

Method of patterning sub-0.25&lgr; line features with high transmission, “attenuated” phase shift masks

Inventors: J. Fung Chen, Roger Caldwell, Tom Laidig, Kurt E. Wampler
Patented Case View Patent ↗
Granted: Nov 19, 2002 Filed: Oct 15, 2001
Inventors
J. Fung Chen
Roger Caldwell
Tom Laidig
Kurt E. Wampler
Assignee (at issue)
ASML Masktools Netherlands B.V.

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Quick Facts
Patent No.
US 6,482,555
App. No.
09/976,336
Filed
2001-10-15
Granted
2002-11-19
Kind
B2