Granted Patent
Utility
US 6,493,070 · App. 09/642,793
Method for in-situ monitoring layer uniformity of sputter coating based on intensity distribution of plasma spectrum
Inventors:
Cheng-Chung Jaing, Chuen-Horng Tsai, Jyh-Shin Chen, Ming-Hwu Cheng, Ho-Yen Hsiao, Py-Shiun Yeh, Jiann-Shiun Kao
Patented Case
View Patent ↗
Granted: Dec 10, 2002
Filed: Aug 22, 2000
Inventors
Cheng-Chung Jaing
Chuen-Horng Tsai
Jyh-Shin Chen
Ming-Hwu Cheng
Ho-Yen Hsiao
Py-Shiun Yeh
Jiann-Shiun Kao
Assignee (at issue)
Precision Instrument Development Center of National Science Council
This patent predates the USPTO's electronic file wrapper — prosecution documents from this era exist only in the Patent Office's paper records. A certified copy of the file history can be ordered from the USPTO's paper archives.