Granted Patent
Utility
US 6,518,191 · App. 09/798,913
Method for etching organic film, method for fabricating semiconductor device and pattern formation method
Inventor:
Hideo Nakagawa
Patented Case
View Patent ↗
Granted: Feb 11, 2003
Filed: Mar 6, 2001
Inventor
Hideo Nakagawa
Assignee (at issue)
SUMITOMO ELECTRIC INDUSTRIES, LTD.
This patent predates the USPTO's electronic file wrapper — prosecution documents from this era exist only in the Patent Office's paper records. A certified copy of the file history can be ordered from the USPTO's paper archives.