Granted Patent
Utility
US 6,528,387 · App. 09/446,306
SOI substrate and process for preparing the same, and semiconductor device and process for preparing the same
Inventors:
Yoshitaka Moriyasu, Takashi Morishita, Masahiro Matsui, Makoto Ishida
Patented Case
View Patent ↗
Granted: Mar 4, 2003
Filed: Dec 20, 1999
Inventors
Yoshitaka Moriyasu
Takashi Morishita
Masahiro Matsui
Makoto Ishida
Assignee (at issue)
ASAHI KASEI KABUSHIKI KAISHA
This patent predates the USPTO's electronic file wrapper — prosecution documents from this era exist only in the Patent Office's paper records. A certified copy of the file history can be ordered from the USPTO's paper archives.