Granted Patent
Utility
US 6,534,411 · App. 09/548,616
Method of high density plasma metal etching
Inventors:
Lewis Shen, Wenge Yang
Patented Case
View Patent ↗
Granted: Mar 18, 2003
Filed: Apr 13, 2000
Inventors
Lewis Shen
Wenge Yang
Assignee (at issue)
Advanced Micro Devices, Inc.
This patent predates the USPTO's electronic file wrapper — prosecution documents from this era exist only in the Patent Office's paper records. A certified copy of the file history can be ordered from the USPTO's paper archives.