Granted Patent
Utility
US 6,555,194 · App. 09/705,092
Process for producing low defect density, ideal oxygen precipitating silicon
Inventors:
Robert Falster, Joseph C. Holzer, Marco Cornara, Daniela Gambaro, Massimiliano Olmo, Steve A. Markgraf, Paolo Mutti, Seamus A. McQuaid, Bayard K. Johnson
Patented Case
View Patent ↗
Granted: Apr 29, 2003
Filed: Nov 2, 2000
Inventors
Robert Falster
Joseph C. Holzer
Marco Cornara
Daniela Gambaro
Massimiliano Olmo
Steve A. Markgraf
Paolo Mutti
Seamus A. McQuaid
Bayard K. Johnson
Assignee (at issue)
MEMC Electronic Materials, Inc.
This patent predates the USPTO's electronic file wrapper — prosecution documents from this era exist only in the Patent Office's paper records. A certified copy of the file history can be ordered from the USPTO's paper archives.