IP Library Granted Patent US 6,600,162
Granted Patent Utility
US 6,600,162 · App. 09/600,477

Method and device for exposing a substrate to light

Inventors: Peter Hahmann, Dirk Beyer, Dorothee Krauhs, Thomas Elster
Patented Case View Patent ↗
Granted: Jul 29, 2003 Filed: Sep 21, 2000
Inventors
Peter Hahmann
Dirk Beyer
Dorothee Krauhs
Thomas Elster
Assignee (at issue)
Leica Microsystems Lithography

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Quick Facts
Patent No.
US 6,600,162
App. No.
09/600,477
Filed
2000-09-21
Granted
2003-07-29
Kind
B1