Granted Patent
Utility
US 6,611,316 · App. 10/083,667
Method and system for dual reticle image exposure
Inventor:
Harry Sewell
Patented Case
View Patent ↗
Granted: Aug 26, 2003
Filed: Feb 27, 2002
Inventor
Harry Sewell
Assignee (at issue)
ASML Holding N.V.
This patent predates the USPTO's electronic file wrapper — prosecution documents from this era exist only in the Patent Office's paper records. A certified copy of the file history can be ordered from the USPTO's paper archives.