Granted Patent
Utility
US 6,613,642 · App. 10/016,075
Method for surface roughness enhancement in semiconductor capacitor manufacturing
Inventors:
Stephen Rahn, Irene McStay, Helmut Tews, Uwe Schroeder, Stephan Kudelka, Rajarao Jammy
Patented Case
View Patent ↗
Granted: Sep 2, 2003
Filed: Dec 13, 2001
Inventors
Stephen Rahn
Irene McStay
Helmut Tews
Uwe Schroeder
Stephan Kudelka
Rajarao Jammy
Assignee (at issue)
International Business Machines Corporation
This patent predates the USPTO's electronic file wrapper — prosecution documents from this era exist only in the Patent Office's paper records. A certified copy of the file history can be ordered from the USPTO's paper archives.