Granted Patent
Utility
US 6,613,834 · App. 09/797,865
Low dielectric constant film material, film and semiconductor device using such material
Inventors:
Yoshihiro Nakata, Shun-ichi Fukuyama, Katsumi Suzuki, Ei Yano, Tamotsu Owada, Iwao Sugiura
Patented Case
View Patent ↗
Granted: Sep 2, 2003
Filed: Mar 5, 2001
Inventors
Yoshihiro Nakata
Shun-ichi Fukuyama
Katsumi Suzuki
Ei Yano
Tamotsu Owada
Iwao Sugiura
Assignee (at issue)
Fujitsu Limited
This patent predates the USPTO's electronic file wrapper — prosecution documents from this era exist only in the Patent Office's paper records. A certified copy of the file history can be ordered from the USPTO's paper archives.