Granted Patent
Utility
US 6,616,766 · App. 10/335,404
Method and apparatus for providing uniform gas delivery to substrates in CVD and PECVD processes
Inventor:
Scott Dunham
Patented Case
View Patent ↗
Granted: Sep 9, 2003
Filed: Dec 30, 2002
Inventor
Scott Dunham
Assignee (at issue)
Genus, Inc.
This patent predates the USPTO's electronic file wrapper — prosecution documents from this era exist only in the Patent Office's paper records. A certified copy of the file history can be ordered from the USPTO's paper archives.