IP Library › Granted Patent US 6,617,012
Granted Patent Utility
US 6,617,012 · App. 10/112,192

Styrene-acrylonitrile as a resist for making patterned media

Inventors: HongYing Wang, Koichi Wago, Neil Deeman, Nobuo Kurataka
Patented Case View Patent ↗
Granted: Sep 9, 2003 Filed: Mar 29, 2002
Inventors
HongYing Wang
Koichi Wago
Neil Deeman
Nobuo Kurataka
Assignee (at issue)
Seagate Technology LLC

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Quick Facts
Patent No.
US 6,617,012
App. No.
10/112,192
Filed
2002-03-29
Granted
2003-09-09
Kind
B1