Granted Patent
Utility
US 6,617,095 · App. 09/827,095
Evaluating method of hydrophobic process, forming method of resist pattern, and forming system of resist pattern
Inventors:
Junichi Kitano, Keiko Hada, Yuko Ono, Takayuki Katano, Hidefumi Matsui
Patented Case
View Patent ↗
Granted: Sep 9, 2003
Filed: Apr 6, 2001
Inventors
Junichi Kitano
Keiko Hada
Yuko Ono
Takayuki Katano
Hidefumi Matsui
Assignee (at issue)
Tokyo Electron Limited
This patent predates the USPTO's electronic file wrapper — prosecution documents from this era exist only in the Patent Office's paper records. A certified copy of the file history can be ordered from the USPTO's paper archives.