Granted Patent
Utility
US 6,620,335 · App. 09/455,641
Plasma etch reactor and method
Inventors:
Stephen P. DeOrnellas, Leslie G. Jerde, Alferd Cofer, Robert C. Vail, Kurt A. Olson
Patented Case
View Patent ↗
Granted: Sep 16, 2003
Filed: Dec 7, 1999
Inventors
Stephen P. DeOrnellas
Leslie G. Jerde
Alferd Cofer
Robert C. Vail
Kurt A. Olson
Assignee (at issue)
TEGAL CORPORATION
This patent predates the USPTO's electronic file wrapper — prosecution documents from this era exist only in the Patent Office's paper records. A certified copy of the file history can be ordered from the USPTO's paper archives.