Granted Patent
Utility
US 6,627,096 · App. 09/847,798
Single mask technique for making positive and negative micromachined features on a substrate
Inventors:
David W. Sherrer, Gregory A. Ten Eyck, Dan Steinberg, Neal Paul Ricks
Patented Case
View Patent ↗
Granted: Sep 30, 2003
Filed: May 2, 2001
Inventors
David W. Sherrer
Gregory A. Ten Eyck
Dan Steinberg
Neal Paul Ricks
Assignee (at issue)
Shipley Company, L.L.C.
This patent predates the USPTO's electronic file wrapper — prosecution documents from this era exist only in the Patent Office's paper records. A certified copy of the file history can be ordered from the USPTO's paper archives.