IP Library › Granted Patent US 6,627,267
Granted Patent Utility
US 6,627,267 · App. 09/853,906

Plasma enhanced chemical deposition with low vapor pressure compounds

Inventor: John D. Affinito
Patented Case View Patent ↗
Granted: Sep 30, 2003 Filed: May 11, 2001
Inventor
John D. Affinito
Assignee (at issue)
Battelle Memorial Institute

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Quick Facts
Patent No.
US 6,627,267
App. No.
09/853,906
Filed
2001-05-11
Granted
2003-09-30
Kind
B2