IP Library › Granted Patent US 6,638,411
Granted Patent Utility
US 6,638,411 · App. 09/492,138

Method and apparatus for plating substrate with copper

Inventors: Koji Mishima, Mizuki Nagai, Ryoichi Kimizuka, Tetsuo Matsuda, Hisashi Kaneko
Patented Case View Patent ↗
Granted: Oct 28, 2003 Filed: Jan 27, 2000
Inventors
Koji Mishima
Mizuki Nagai
Ryoichi Kimizuka
Tetsuo Matsuda
Hisashi Kaneko
Assignees (at issue)
EBARA CORPORATION
Kabushiki Kaisha Toshiba

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Quick Facts
Patent No.
US 6,638,411
App. No.
09/492,138
Filed
2000-01-27
Granted
2003-10-28
Kind
B1