IP Library › Granted Patent US 6,653,177
Granted Patent Utility
US 6,653,177 · App. 09/961,871

Patterning method, thin film transistor matrix substrate manufacturing method, and exposure mask

Inventor: Hideaki Takizawa
Patented Case View Patent ↗
Granted: Nov 25, 2003 Filed: Sep 24, 2001
Inventor
Hideaki Takizawa
Assignee (at issue)
FUJITSU DISPLAY TECHNOLOGIES CORPORATION

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Quick Facts
Patent No.
US 6,653,177
App. No.
09/961,871
Filed
2001-09-24
Granted
2003-11-25
Kind
B2