Granted Patent
Utility
US 6,656,018 · App. 09/545,982
Polishing pads useful in chemical mechanical polishing of substrates in the presence of a slurry containing abrasive particles
Inventors:
Oscar K. Hsu, Jean Vangsness, Scott C. Billings, David S. Gilbride
Patented Case
View Patent ↗
Granted: Dec 2, 2003
Filed: Apr 10, 2000
Inventors
Oscar K. Hsu
Jean Vangsness
Scott C. Billings
David S. Gilbride
Assignee (at issue)
Freudenberg Nonwovens, L.P.
This patent predates the USPTO's electronic file wrapper — prosecution documents from this era exist only in the Patent Office's paper records. A certified copy of the file history can be ordered from the USPTO's paper archives.