Granted Patent
Utility
US 6,657,267 · App. 10/163,930
Semiconductor device and fabrication technique using a high-K liner for spacer etch stop
Inventors:
Qi Xiang, Olov Karlsson, Haihong Wang, Bin Yu
Patented Case
View Patent ↗
Granted: Dec 2, 2003
Filed: Jun 6, 2002
Inventors
Qi Xiang
Olov Karlsson
Haihong Wang
Bin Yu
Assignee (at issue)
Advanced Micro Devices, Inc.
This patent predates the USPTO's electronic file wrapper — prosecution documents from this era exist only in the Patent Office's paper records. A certified copy of the file history can be ordered from the USPTO's paper archives.