IP Library Granted Patent US 6,657,302
Granted Patent Utility
US 6,657,302 · App. 09/464,811

Integration of low dielectric material in semiconductor circuit structures

Inventors: Huili Shao, Susan Clay Vitkavage, Allen Yen
Patented Case View Patent ↗
Granted: Dec 2, 2003 Filed: Dec 17, 1999
Inventors
Huili Shao
Susan Clay Vitkavage
Allen Yen
Assignee (at issue)
Agere Systems Inc.

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Quick Facts
Patent No.
US 6,657,302
App. No.
09/464,811
Filed
1999-12-17
Granted
2003-12-02
Kind
B1