Granted Patent
Utility
US 6,660,618 · App. 09/640,080
Reverse mask and oxide layer deposition for reduction of vertical capacitance variation in multi-layer metallization systems
Inventors:
Susan H. Chen, Paul R. Besser
Patented Case
View Patent ↗
Granted: Dec 9, 2003
Filed: Aug 17, 2000
Inventors
Susan H. Chen
Paul R. Besser
Assignee (at issue)
Advanced Micro Devices, Inc.
This patent predates the USPTO's electronic file wrapper — prosecution documents from this era exist only in the Patent Office's paper records. A certified copy of the file history can be ordered from the USPTO's paper archives.