IP Library › Granted Patent US 6,664,738
Granted Patent Utility
US 6,664,738 · App. 10/083,381

Plasma processing apparatus

Inventors: Masatsugu Arai, Ryujiro Udo, Naoyuki Tamura, Masanori Kadotani, Motohiko Yoshigai
Patented Case View Patent ↗
Granted: Dec 16, 2003 Filed: Feb 27, 2002
Inventors
Masatsugu Arai
Ryujiro Udo
Naoyuki Tamura
Masanori Kadotani
Motohiko Yoshigai
Assignees (at issue)
HITACHI, LTD.
Hitachi High-Technologies Corporation

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Quick Facts
Patent No.
US 6,664,738
App. No.
10/083,381
Filed
2002-02-27
Granted
2003-12-16
Kind
B2