IP Library › Granted Patent US 6,696,371
Granted Patent Utility
US 6,696,371 · App. 10/163,007

Method for fabricating positionally exact surface-wide membrane masks

Inventors: Joerg Butschke, Albrecht Ehrmann, Ernst Haugeneder, Florian Letzkus, Reinhard Springer
Patented Case View Patent ↗
Granted: Feb 24, 2004 Filed: Jun 5, 2002
Inventors
Joerg Butschke
Albrecht Ehrmann
Ernst Haugeneder
Florian Letzkus
Reinhard Springer
Assignees (at issue)
Infineon Technologies AG
IMS-Ionen Mikrofabrikationas Systeme

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Quick Facts
Patent No.
US 6,696,371
App. No.
10/163,007
Filed
2002-06-05
Granted
2004-02-24
Kind
B2