Granted Patent
Utility
US 6,740,158 · App. 10/142,312
Process for coating silicon shot with dopant for addition of dopant in crystal growth
Inventor:
Bernhard P. Piwczyk
Patented Case
View Patent ↗
Granted: May 25, 2004
Filed: May 9, 2002
Inventor
Bernhard P. Piwczyk
Assignee (at issue)
RWE Schott Solar GmbH
This patent predates the USPTO's electronic file wrapper — prosecution documents from this era exist only in the Patent Office's paper records. A certified copy of the file history can be ordered from the USPTO's paper archives.