Granted Patent
Utility
US 6,746,825 · App. 09/971,442
Guided self-assembly of block copolymer films on interferometrically nanopatterned substrates
Inventors:
Paul Franklin Nealey, Juan DePablo, Francesco Cerrina, Harun Solak, XiaoMin Yang, Richard D. Peters, Qiang Wang
Patented Case
View Patent ↗
Granted: Jun 8, 2004
Filed: Oct 5, 2001
Inventors
Paul Franklin Nealey
Juan DePablo
Francesco Cerrina
Harun Solak
XiaoMin Yang
Richard D. Peters
Qiang Wang
Assignee (at issue)
Wisconsin Alumni Research Foundation
This patent predates the USPTO's electronic file wrapper — prosecution documents from this era exist only in the Patent Office's paper records. A certified copy of the file history can be ordered from the USPTO's paper archives.