Granted Patent
Utility
US 6,750,000 · App. 10/671,666
Electron device manufacturing method, a pattern forming method, and a photomask used for those methods
Inventors:
Toshihiko Tanaka, Norio Hasegawa, Hiroshi Shiraishi, Hidetoshi Satoh
Patented Case
View Patent ↗
Granted: Jun 15, 2004
Filed: Sep 29, 2003
Inventors
Toshihiko Tanaka
Norio Hasegawa
Hiroshi Shiraishi
Hidetoshi Satoh
Assignee (at issue)
Renesas Technology Corporation
This patent predates the USPTO's electronic file wrapper — prosecution documents from this era exist only in the Patent Office's paper records. A certified copy of the file history can be ordered from the USPTO's paper archives.