IP Library › Granted Patent US 6,753,126
Granted Patent Utility
US 6,753,126 · App. 10/073,693

Polymer for chemically amplified resist and chemically amplified resist composition containing the same

Inventors: Joohyeon Park, Dongchul Seo, Jongbum Lee, Hyunpyo Jeon, Seongju Kim
Patented Case View Patent ↗
Granted: Jun 22, 2004 Filed: Feb 11, 2002
Inventors
Joohyeon Park
Dongchul Seo
Jongbum Lee
Hyunpyo Jeon
Seongju Kim
Assignee (at issue)
KOREA KUMHO PETROCHEMICAL CO., LTD.

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Quick Facts
Patent No.
US 6,753,126
App. No.
10/073,693
Filed
2002-02-11
Granted
2004-06-22
Kind
B2