Granted Patent
Utility
US 6,756,314 · App. 10/647,614
Method for etching a hard mask layer and a metal layer
Inventor:
Ulrich Baier
Patented Case
View Patent ↗
Granted: Jun 29, 2004
Filed: Aug 25, 2003
Inventor
Ulrich Baier
Assignee (at issue)
Infineon Technologies AG
This patent predates the USPTO's electronic file wrapper — prosecution documents from this era exist only in the Patent Office's paper records. A certified copy of the file history can be ordered from the USPTO's paper archives.