IP Library › Granted Patent US 6,759,323
Granted Patent Utility
US 6,759,323 · App. 09/793,345

Method for filling depressions in a surface of a semiconductor structure, and a semiconductor structure filled in this way

Inventor: Markus Kirchhoff
Patented Case View Patent ↗
Granted: Jul 6, 2004 Filed: Feb 26, 2001
Inventor
Markus Kirchhoff
Assignee (at issue)
Infineon Technologies AG

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Quick Facts
Patent No.
US 6,759,323
App. No.
09/793,345
Filed
2001-02-26
Granted
2004-07-06
Kind
B2