Granted Patent
Utility
US 6,761,770 · App. 10/226,773
Atmospheric pressure wafer processing reactor having an internal pressure control system and method
Inventors:
Lawrence D. Bartholomew, Robert J. Bailey, Seung Park, Soon Yuh
Patented Case
View Patent ↗
Granted: Jul 13, 2004
Filed: Aug 23, 2002
Inventors
Lawrence D. Bartholomew
Robert J. Bailey
Seung Park
Soon Yuh
Assignee (at issue)
Aviza Technology Limited
This patent predates the USPTO's electronic file wrapper — prosecution documents from this era exist only in the Patent Office's paper records. A certified copy of the file history can be ordered from the USPTO's paper archives.