IP Library › Granted Patent US 6,775,069
Granted Patent Utility
US 6,775,069 · App. 10/270,556

Advanced illumination system for use in microlithography

Inventors: Mark Oskotsky, Lev Ryzhikov, Scott Coston, James Tsacoyeanes, Peter Baumgartner, Walter Augustyn
Patented Case View Patent ↗
Granted: Aug 10, 2004 Filed: Oct 16, 2002
Inventors
Mark Oskotsky
Lev Ryzhikov
Scott Coston
James Tsacoyeanes
Peter Baumgartner
Walter Augustyn
Assignee (at issue)
ASML Holding N.V.

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Quick Facts
Patent No.
US 6,775,069
App. No.
10/270,556
Filed
2002-10-16
Granted
2004-08-10
Kind
B2