Granted Patent
Utility
US 6,780,769 · App. 10/464,502
Method of manufacturing structure for connecting interconnect lines including metal layer with thickness larger than thickness of metallic compound layer
Inventors:
Masahiko Fujisawa, Akihiko Ohsaki, Noboru Morimoto
Patented Case
View Patent ↗
Granted: Aug 24, 2004
Filed: Jun 19, 2003
Inventors
Masahiko Fujisawa
Akihiko Ohsaki
Noboru Morimoto
Assignee (at issue)
Renesas Technology Corporation
This patent predates the USPTO's electronic file wrapper — prosecution documents from this era exist only in the Patent Office's paper records. A certified copy of the file history can be ordered from the USPTO's paper archives.