IP Library › Granted Patent US 6,791,188
Granted Patent Utility
US 6,791,188 · App. 10/228,064

Thin film aluminum alloy and sputtering target to form the same

Inventors: Junichiro Hagihara, Ichiro Tokuda
Patented Case View Patent ↗
Granted: Sep 14, 2004 Filed: Aug 27, 2002
Inventors
Junichiro Hagihara
Ichiro Tokuda
Assignee (at issue)
Vacuum Metallurgical Co., Ltd.

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Quick Facts
Patent No.
US 6,791,188
App. No.
10/228,064
Filed
2002-08-27
Granted
2004-09-14
Kind
B2