Granted Patent
Utility
US 6,796,316 · App. 09/848,533
Atomic layer deposition (ALD) thin film deposition equipment having cleaning apparatus and cleaning method
Inventor:
Young-Hoon Park
Patented Case
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Granted: Sep 28, 2004
Filed: May 3, 2001
Inventor
Young-Hoon Park
Assignee (at issue)
IPS Group Inc.
This patent predates the USPTO's electronic file wrapper — prosecution documents from this era exist only in the Patent Office's paper records. A certified copy of the file history can be ordered from the USPTO's paper archives.