Granted Patent
Utility
US 6,824,958 · App. 10/025,457
Method of manufacturing photomask and method of manufacturing semiconductor integrated circuit device
Inventors:
Katsuya Hayano, Norio Hasegawa
Patented Case
View Patent ↗
Granted: Nov 30, 2004
Filed: Dec 26, 2001
Inventors
Katsuya Hayano
Norio Hasegawa
Assignee (at issue)
Renesas Technology Corporation
This patent predates the USPTO's electronic file wrapper — prosecution documents from this era exist only in the Patent Office's paper records. A certified copy of the file history can be ordered from the USPTO's paper archives.