Granted Patent
Utility
US 6,827,866 · App. 10/027,882
Deep-well lithography process for forming micro-electro-mechanical structures
Inventor:
Vlad Novotny
Patented Case
View Patent ↗
Granted: Dec 7, 2004
Filed: Dec 21, 2001
Inventor
Vlad Novotny
Assignee (at issue)
Active Optical Networks, Inc.
This patent predates the USPTO's electronic file wrapper — prosecution documents from this era exist only in the Patent Office's paper records. A certified copy of the file history can be ordered from the USPTO's paper archives.