IP Library Granted Patent US 6,828,247
Granted Patent Utility
US 6,828,247 · App. 10/214,754

Method for etching organic film, method for fabricating semiconductor device and pattern formation method

Inventors: Hideo Nakagawa, Toshio Hayashi, Yasuhiro Morikawa
Patented Case View Patent ↗
Granted: Dec 7, 2004 Filed: Aug 9, 2002
Inventors
Hideo Nakagawa
Toshio Hayashi
Yasuhiro Morikawa
Assignees (at issue)
SUMITOMO ELECTRIC INDUSTRIES, LTD.
ULVAC, INC.

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Quick Facts
Patent No.
US 6,828,247
App. No.
10/214,754
Filed
2002-08-09
Granted
2004-12-07
Kind
B2