Granted Patent
Utility
US 6,835,417 · App. 10/375,529
Method and device for depositing thin layers via ALD/CVD processes in combination with rapid thermal processes
Inventors:
Annette Saenger, Bernhard Sell, Harald Seidl, Thomas Hecht, Martin Gutsche
Patented Case
View Patent ↗
Granted: Dec 28, 2004
Filed: Feb 27, 2003
Inventors
Annette Saenger
Bernhard Sell
Harald Seidl
Thomas Hecht
Martin Gutsche
Assignee (at issue)
Infineon Technologies AG
This patent predates the USPTO's electronic file wrapper — prosecution documents from this era exist only in the Patent Office's paper records. A certified copy of the file history can be ordered from the USPTO's paper archives.