IP Library Granted Patent US 6,858,838
Granted Patent B2
US 6,858,838 · App. 10/451,635 · Granted Feb 22, 2005

Neutral particle beam processing apparatus

Assignee: Ebara Corporation
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Quick Facts
Patent No.
US 6,858,838
App. No.
10/451,635
Granted
Feb 22, 2005
Kind
B2
Abstract

A neutral particle beam processing apparatus comprises a plasma generator for generating positive ions and/or negative ions in a plasma, a pair of electrodes ( 5, 6 ) involving the plasma generated by the plasma generator therebetween, and a power supply ( 102 ) for applying a voltage between the pair of electrodes ( 5, 6 ). The pair of electrodes ( 5, 6 ) accelerate the positive ions and/or the negative ions generated by the plasma generator. The positive ions and/or the negative ions are neutralized and converted into neutral particles while being drifted in the plasma between the pair of electrodes ( 5, 6 ) toward a workpiece (X). The accelerated neutral particles pass through one of the electrodes ( 6 ) and are applied to the workpiece (X).

Claims (15)

1. A neutral particle beam processing apparatus comprising:

a plasma generator for generating at least one of positive ions and negative ions in a plasma;

a pair of electrodes, one of the pair of electrodes being located at an opposite end of said plasma generator in relation to the other electrode of said pair of electrodes; and

a power supply for applying a voltage between said pair of electrodes;

wherein said pair of electrodes accelerate said at least one of positive ions and negative ions generated by said plasma generator;

said at least one of positive ions and negative ions are neutralized and converted into neutral particles while being drifted in said plasma between said pair of electrodes toward a workpiece; and

said accelerated neutral particles pass through one of said electrodes and are applied to said workpiece.

2. A neutral particle beam processing apparatus according to claim 1 , wherein said plasma generator alternately performs application of a high-frequency voltage and interruption of said high-frequency voltage repeatedly; and

said at least one of positive ions and negative ions generated by said plasma generator are extracted from said plasma and accelerated in a predetermined direction while said high-frequency voltage is being interrupted.

3. A neutral particle beam processing apparatus according to claim 1 , wherein one of said electrodes comprises a meshed electrode.

4. A neutral particle beam processing apparatus according to claim 1 , further comprising a drift space through which said at least one of positive ions and negative ions in said plasma are drifted toward said workpiece for thereby being neutralized and converted into neutral particles.

5. A neutral particle beam processing apparatus according to claim 2 wherein application of a voltage applied to said pair of electrodes is synchronized with said application of a high-frequency voltage.

6. A neutral particle beam processing apparatus according to claim 1 , wherein said plasma generator is configured to generate at least one of positive ions and negative ions by inductively coupled plasma.

7. A neutral particle beam processing apparatus according to claim 1 , further comprising a deflector disposed downstream of pair of electrodes for preventing charged particles from being applied to the workpiece.

8. A neutral particle beam processing apparatus according to claim 1 , further comprising an electron trap disposed downstream of said pair of electrodes for preventing charged particles from being applied to the workpiece.

Assignments (2)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Aug 4, 2008
From: EBARA CORPORATION
To: TOHOKU TECHNO ARCH CO., LTD.
Reel/Frame 021328/0642 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Dec 1, 2003
From: ICHIKI, KATSUNORI; YAMAUCHI, KAZUO; HIYAMA, HIROKUNI; SAMUKAWA, SEIJI
To: EBARA CORPORATION
Reel/Frame 014744/0127 →
Priority Claims (1)
JP 2001-088860 · Mar 26, 2001 · national
Continuity (1)
Related Publication 20040074604A1 · Apr 22, 2004