Thermionic-cathode for pre-ionization of an extreme ultraviolet (EUV) source supply
A source of soft x-rays in an Extreme Ultraviolet (EUV) lithography system may include a pre-ionization unit to pre-ionize a source material, e.g., a Xenon plasma. The pre-ionization unit may be integrated with a discharge unit, and may use Lanthanum Hexaboride (LaB 6 ) as a thermionic emitter material.
1. A method comprising:
pre-ionizing a source material with a thermionic emitter comprising a single crystal Lanthanum Hexaboride (LaB6) material having a (100) crystallographic orientation;
ionizing the source material to a desired ionization state; and
generating a plasma from the source material, said plasma emitting an extreme ultraviolet radiation.
2. The method of claim 1 , wherein said pre-ionizing the source material comprises heating a thermionic emission material having a work function less than about 2.7 eV.
3. The method of claim 1 , wherein said generating a plasma comprises generating a plasma emitting radiation including a wavelength in the range of about 10 nm to about 20 nm.
4. The method of claim 1 , further comprising:
guiding said extreme ultraviolet radiation to a photoresist material on a substrate; and
exposing the photoresist material with at least a portion of said extreme ultraviolet radiation.
5. The method of claim 1 , wherein the source material comprises a noble gas.
6. A source of extreme ultraviolet radiation comprising:
a pre-ionization cathode including a thermionic emission material comprising a single crystal Lanthanum Hexaboride (LaB6) material having a (100) crystallographic orientation;
an anode; and
a pre-ionization voltage supply operative to generate a voltage between the pre-ionization cathode and the anode sufficient to pre-ionize a source material.
7. The source of claim 6 , further comprising:
a discharge cathode; and
a discharge voltage supply operative to generate a voltage between the anode and the discharge cathode sufficient to generate a plasma from a pre-ionized source material.
8. The source of claim 7 , wherein said plasma emits radiation in the extreme ultraviolet spectrum.
9. The source of claim 7 , wherein said plasma emits radiation in a range of about 10 nm to about 20 nm.
10. The source of claim 6 , wherein the thermionic emission material has a work function of less than about 2.7 eV.
11. A system comprising:
a source of extreme ultraviolet radiation including a pre-ionization module operative to pre-ionize a source material, the pre-ionization module including a thermionic emitter comprising a single crystal Lanthanum Hexaboride (LaB6) material having a (100) crystallographic orientation;
a substrate having a surface including a photoresist material; and
a plurality of mirrors operative to direct at least a portion of the extreme ultraviolet radiation toward the photoresist material.
12. The system of claim 11 , wherein the thermionic emission material has a work function of less than about 2.7 eV.
13. The system of claim 11 , further comprising a filter operative to filter a wavelength in the range of from about 10 nm to about 20 nm from the extreme ultraviolet radiation.