Method of depositing dielectric materials in damascene applications

1. A method for processing a substrate, comprising:

depositing a first barrier layer by a process comprising:

introducing a processing gas consisting essentially carbon dioxide, an inert gas, and an oxygen-free organosilicon compound to the processing chamber; and

reacting the processing gas to deposit an oxygen-doped silicon carbide on a surface of the substrate, wherein the oxygen-doped silicon carbide has an oxygen content of about 15 atomic percent or less;

depositing a first dielectric layer on the first barrier layer;

depositing a second barrier layer on the first dielectric layer; and then

etching feature definitions in the second barrier layer to expose the first dielectric layer.

2. The method of claim 1 , wherein the oxygen-free organosilicon compound comprises an organosilane compound selected from the group of methylsilane, dimethylsilane, trimethylsilane, ethylsilane, disilanomethane, bis(methylsilano)methane, 1,2-disilanoethane, 1,2-bis(methylsilano)ethane, 2,2-disilanopropane, 1,3,5-trisilano-2,4,6-trimethylene, and combinations thereof.

3. The method of claim 1 , further comprising depositing a second dielectric layer on the second barrier layer.

4. The method of claim 1 , further comprising:

depositing a photoresist material on the second dielectric layer;

patterning the photoresist layer;

etching the second dielectric layer, the first dielectric layer, and the first barrier layer to define an interconnect feature definition therethrough; and

depositing one or more conductive materials to fill the interconnect opening.

5. The method of claim 1 , wherein the oxygen-doped silicon carbide has an oxygen content between about 3 atomic % and about 10 atomic % of oxygen.

6. The method of claim 1 , wherein the inert gas selected is from the group of argon, helium, neon, xenon, or krypton, and combinations thereof.

7. The method of claim 1 , wherein the second barrier layer is deposited by a process comprising:

introducing a processing gas consisting essentially carbon dioxide, an inert gas, and an oxygen-free organosilicon compound to the processing chamber; and

reacting the processing gas to deposit an oxygen-doped silicon carbide on the substrate, wherein the oxygen-doped silicon carbide comprises silicon, oxygen, and carbon, and has an oxygen content of about 15 atomic percent or less.

8. The method of claim 1 , wherein reacting the processing gas comprises generating a plasma by applying a power density between about 0.03 watts/cm 2 and about 1500 watts/cm 2 .

9. The method of claim 1 , wherein the oxygen-free organosilicon precursor comprises Si—H bonds.

10. The method of claim 1 , wherein the reacting the processing gas to deposit the oxygen-doped silicon carbide comprises supplying trimethylsilane to a plasma processing chamber at a flow rate between about 50 milligrams/minute (mgm) and about 1000 mgm, supplying carbon dioxide at a flow rate between about 50 milligrams/minute (mgm) and about 1000 mgm, supplying helium at a flow rate between about 100 sccm and about 2000 sccm, maintaining a substrate temperature between about 200° C. and about 450° C., maintaining a chamber pressure between 2 Torr and 10 Torr, and an RF power of between about 10 watts and about 1000 watts.

11. The method of claim 1 , further comprising exposing the oxygen-doped silicon carbide to an annealing process, a plasma treatment process or both.

12. The method of claim 1 , further comprising depositing a silicon carbide cap layer on the substrate surface prior to deposition of the oxygen-doped silicon carbide.

13. The method of claim 1 , wherein the oxygen-free organosilicon compound is trimethylsilane and the inert gas is helium.

14. The method of claim 1 , wherein substrate surface comprises a dielectric material, a metal material, or combinations thereof.

15. The method of claim 1 , wherein the metal material comprises copper.

16. A method for processing a substrate, comprising:

depositing at least one dielectric layer on a substrate surface;

forming an hardmask layer having an oxygen content of about 15 atomic percent or less on the at least one dielectric layer, wherein the hardmask layer is deposited by a process comprising:

introducing a processing gas consisting essentially carbon dioxide, an inert gas, and an oxygen-free organosilicon compound to a processing chamber; and

reacting the processing gas in a plasma to deposit an oxygen-doped silicon carbide material;

defining a pattern in at least one region of the hardmask layer;

forming a feature definition in the at least one dielectric layer by the pattern formed in the at least one region of the hardmask layer;

depositing a conductive material in the feature definition;

polishing the conductive material, wherein the polishing process has a removal rate ratio between the conductive material and the hardmask layer of about 4:1 or greater.

17. The method of claim 16 , wherein at least one of the at least one dielectric layers comprises silicon, oxygen, and carbon and has a dielectric constant of about 3 or less.

18. The method of claim 16 , wherein the at least one dielectric layer comprises depositing a first barrier layer by a process comprising:

introducing a processing gas consisting essentially carbon dioxide, an inert gas, and an oxygen-free organosilicon compound to the processing chamber; and

reacting the processing gas to deposit an oxygen-doped silicon carbide on a surface of the substrate, wherein the oxygen-doped silicon carbide has an oxygen content of about 15 atomic percent or less;

depositing a first dielectric layer on the first barrier layer; and

depositing a second barrier layer on the first dielectric layer.

19. The method of claim 16 , wherein the removal rate ratio between the conductive material and the hardmask layer is greater than about 4.5:1.

20. The method of claim 17 , wherein the removal rate ratio between the at least one dielectric layer and the hardmask layer is greater than about 6:1.

21. The method of claim 16 , wherein the oxygen-free organosilicon compound comprises an organosilane compound selected from the group of methylsilane, dimethylsilane, trimethylsilane, ethylsilane, disilanomethane, bis(methylsilano)methane, 1,2-disilanoethane, 1,2-bis(methylsilano)ethane, 2,2-disilanopropane, 1,3,5-trisilano-2,4,6-trimethylene, and combinations thereof.

22. The method of claim 16 , further comprising exposing the oxygen-doped silicon carbide to an annealing process, a plasma treatment process or both.

23. The method of claim 16 , wherein the oxygen-free organosilicon compound is trimethylsilane and the inert gas is helium.

24. The method of claim 16 , wherein the hardmask layer has an oxygen content between about 3 atomic % and about 10 atomic %.

25. The method of claim 16 , wherein the inert gas is selected from the group of argon, helium, neon, xenon, or krypton, and combinations thereof.

26. The method of claim 16 , wherein the reacting the processing gas to deposit an oxygen-doped silicon carbide comprises supplying trimethylsilane to a plasma processing chamber at a flow rate between about 50 milligrams/minute (mgm) and about 1000 mgm, supplying carbon dioxide at a flow rate between about 50 milligrams/minute (mgm) and about 1000 mgm, supplying helium at a flow rate between about 100 sccm and about 2000 sccm, maintaining a substrate temperature between about 200° C. and about 450° C., maintaining a chamber pressure between 2 Torr and 10 Torr and an RF power of between about 10 watts and about 1000 watts.

27. The method of claim 16 , wherein reacting the processing gas comprises generating a plasma by applying a power density between about 0.03 watts/cm 2 and about 1500 watts/cm 2 .