Micro-support structures
A MEM device in accordance with the invention comprises one or more movable micro-structures which are preferably ribbon structures or cantilever structures. The ribbon structures or cantilever structures are preferably coupled to a substrate structure through one or more support regions comprising a plurality of anchor support features and a plurality of post support features. The MEM device is preferably an optical MEM device with a plurality of movable ribbon structures each being supported by opposing ends through support regions each comprising a plurality of anchor support features and a plurality of post support features. In accordance with the method of the embodiments, the positions of the anchor and post support features, the number of anchor and support features and the spacings between the support features can selected during fabrication of the device to determine an operating condition of the MEM device.
1. A micro-device comprising an elongated micro-structure coupled to a substrate by at least one end through a securing region comprising sets of securing features arranged laterally along the at least one end, wherein the sets of securing features comprise anchor features and post features.
2. The micro-device of claim 1 , wherein the anchor features and the post features are arranged in parallel rows laterally along the at least one end.
3. A micro-device comprising an elongated micro-structure coupled to a substrate by at least one end through a securing region comprising sets of securing features arranged laterally along the at least one end, wherein the elongated micro-structure is a ribbon structure having a length in a range of 50 to 1000 microns and a width in a range of 4.0 to 40 microns.
4. A micro-device comprising an elongated micro-structure coupled to a substrate by at least one end through a securing region comorising sets of securing features arranged laterally along the at least one end, wherein the sets of securing features comprise silicon nitride.
5. The micro-device of claim 4 , wherein the micro-structure comprises silicon nitride and is monolithic with the sets of securing features.
6. A micro-device comprising an elongated micro-structure coupled to a substrate by at least one end through a securing region comprising sets of securing features arranged laterally along the at least one end, wherein the micro-structure comprises a silicon nitride layer with a thickness in a range of 200 to 2000 Angstroms.
7. The micro-device of claim 6 , wherein the micro-structure further comprises a reflective top-layer on at least a portion of the silicon nitride layer, the reflective layer having a thickness in a range of 250 to 1500 Angstroms.