IP Library › Granted Patent US 6,951,627
Granted Patent B2
US 6,951,627 · App. 10/329,036 · Granted Oct 4, 2005

Method of drilling holes with precision laser micromachining

Assignee: Matsushita Electric Industrial Co., Ltd.
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Quick Facts
Patent No.
US 6,951,627
App. No.
10/329,036
Granted
Oct 4, 2005
Kind
B2
Abstract

The invention is an apparatus and a method for drilling holes in a work piece with a laser. A laser beam is received by the optical system and directed along an optical path. The system directs the laser beam through a moveable mask aperture creating a sub-beam, that is reduced in size by a lens system as it is imaged onto a work piece. Multiple features are formed in the work piece by moving the mask.

Claims (17)

1. A method for forming a plurality or features in a work piece with a laser comprising the steps of:

receiving a laser beam directed along an optical path;

directing the laser beam through a mask to create a sub-beam;

imaging the sub-beam onto the work piece through a lens system, the lens system having an absolute magnification of less than 1, to create a reduced-size image of the mask on the work piece at a first location, the reduced-size image exhibiting blurring due to diffraction limiting of the sub-beam;

forming a first feature of said plurality of features with said sub-beam at the first location;

moving the mask to move the reduced-size image of the mask to a second location an the work piece; and

forming at least a second feature of said plurality of features at the second location wherein the first and second features are spaced close together such that the first and second features could not be made by a single mask in a single step due to the diffraction blurring in the reduced-size image.

2. The method of claim 1 , further comprising the step of homogenizing the laser beam before it is directed through the mask.

3. The method of claim 1 , the method further comprising the steps of

viewing the first feature with an imaging system; and

determining an offset between the feature at the first location and the second location;

wherein the step of moving the mask moves the sub-beam from the first feature in the first location to the second area of the work piece.

4. The method of claim 1 further comprising the step of decreasing the wavelength of the laser beam.

5. The method of claim 1 , further comprising the step of attenuating the beam.

6. The method of claim 4 further comprising the step of preferably reflecting the beam with the decreased wavelength relative to the light at the wavelength of the laser.

7. The method of claim 4 , further comprising the step of homogenizing the laser beam before it is directed through the mask.

8. The method of claim 4 , further comprising the step of circularly polarizing the laser beam.

Assignments (1)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Dec 24, 2002
From: LI, MING; ISHIZUKA, MAKOTO; LIU, XINBING
To: MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD.
Reel/Frame 013617/0027 →
Continuity (2)
Provisional Application 6037574100 · Apr 26, 2002
Related Publication 20030201578A1 · Oct 30, 2003