Photosensitive composition and acid generator

1. A photosensitive composition comprising a compound capable of generating an acid upon irradiation with an actinic ray, the compound being represented by the following general formula (I):

wherein R 1 represents a substituted or unsubstituted alkyl group provided that when R 1 represents a substituted alkyl group, the substituent is not an aryl group;

R 2 represents an alkyl group;

Y represents an alkyl group;

Y 1 and Y 2 may be the same or different and each represents an alkyl group, an aryl group, an aralkyl group, or a hetero atom-containing aromatic group;

R 1 and R 2 may be bonded to each other to form a ring;

R 2 and Y may be bonded to each other to form a ring;

Y 1 and Y 2 may be bonded to each other to form a ring;

two or more structures of the general formula (I) may be bonded to each other at any position of R 1 , R 2 or Y, or Y 1 or Y 2 via a connecting group; and

X − represents a non-nucleophilic anion.

2. The photosensitive composition as described in claim 1 , which further comprises (F) a basic compound.

3. The photosensitive composition as described in claim 1 , which further comprises (G) a surfactant containing at least one of a fluorine atom and a silicon atom.

4. The photosensitive composition as described in claim 1 , wherein each of the R 2 and Y in the formula (I) represents an alkyl group having 1 to 20 carbon atoms.

5. The photosensitive composition as described in claim 1 , which further comprises at least one of an arylsulfonium compound and a compound having a phenacylsulfonium salt structure.

6. A method of forming a resist pattern, which comprises: forming a film including the photosensitive composition described in claim 1 ; irradiating the film with an actinic ray; and developing the irradiated film.

7. A positive photosensitive composition comprising:

(A) a compound capable of generating an acid upon irradiation with an actinic ray, the compound being represented by the following general formula (I); and

(B) a resin that is decomposed by the action of an acid to increase its solubility in an alkaline developer:

 wherein R 1 represents a substituted or unsubstituted alkyl group provided that when R 1 represents a substituted alkyl group, the substituent is not an aryl group;

R 2 represents an alkyl group;

Y represents an alkyl group;

Y 1 and Y 2 may be the same or different and each represents an alkyl group, an aryl group, an aralkyl group, or a hetero atom-containing aromatic group;

R 1 and R 2 may be bonded to each other to form a ring;

R 2 and Y may be bonded to each other to form a ring;

Y 1 and Y 2 may be bonded to each other to form a ring;

two or more structures of the general formula (I) may be bonded to each other at any position of R 1 , R 2 or Y, or Y 1 or Y 2 via a connecting group; and

X— represents a non-nucleophilic anion.

8. The positive photosensitive composition as described in claim 7 , wherein the resin (B) contains a hydroxystyrene structural unit.

9. The positive photosensitive composition as described in claim 7 , wherein the resin (B) contains a monocyclic or polycyclic alicyclic hydrocarbon structure.

10. The positive photosensitive composition as described in claim 9 , wherein the resin (B) further contains a repeating unit having a lactone structure.

11. The positive photosensitive composition as described in claim 7 , wherein the resin (B) contains a fluorine atom.

12. The positive photosensitive composition as described in claim 7 , which further comprises (C) a dissolution inhibiting compound having a molecular weight of not more than 3,000, which is decomposed by the action of an acid to increase its solubility in an alkaline developer.

13. A positive photosensitive composition comprising:

(A) a compound capable of generating an acid upon irradiation with an actinic ray, the compound being represented by the following general formula (I);

(D) an alkaline developer-soluble resin; and

(C) a dissolution inhibiting compound having a molecular weight of not more than 3,000, which is decomposed by the action of an acid to increase its solubility in an alkaline developer:

 wherein R 1 represents a substituted or unsubstituted alkyl group provided that when R 1 represents a substituted alkyl group, the substituent is not an aryl group;

R 2 represents an alkyl group;

Y represents an alkyl group;

Y 1 and Y 2 may be the same or different and each represents an alkyl group, an aryl group, an aralkyl group, or a hetero atom-containing aromatic group;

R 1 and R 2 may be bonded to each other to form a ring;

R 2 and Y may be bonded to each other to form a ring;

Y 1 and Y 2 may be bonded to each other to form a ring;

two or more structures of the general formula (I) may be bonded to each other at any position of R 1 , R 2 or Y, or Y 1 or Y 2 via a connecting group; and

X— represents a non-nucleophilic anion.

14. A negative photosensitive composition comprising:

(A) a compound capable of generating an acid upon irradiation with an actinic ray, the compound being represented by the following general formula (I);

(D) an alkaline developer-soluble resin; and

(E) an acid crosslinking agent capable of crosslinking with the alkaline developer-soluble resin by the action of an acid:

 wherein R 1 represents an alkyl group;

R 2 represents a hydrogen atom, an alkyl group, or an aryl group;

Y represents an alkyl group;

Y 1 and Y 2 may be the same or different and each represents an alkyl group, an aryl group, an aralkyl group, or a hetero atom-containing aromatic group;

R 1 and R 2 may be bonded to each other to form a ring;

R 2 and Y may be bonded to each other to form a ring;

Y 1 and Y 2 may be bonded to each other to form a ring;

two or more structures of the general formula (I) may be bonded to each other at any position of R 1 , R 2 or Y, or Y 1 or Y 2 via a connecting group; and

X— represents a non-nucleophilic anion.

15. An acid generator represented by the following general formula (I):

wherein R 1 represents a substituted or unsubstituted alkyl group provided that when R 1 represents a substituted alkyl group, the substituent is not an aryl group;

R 2 represents an alkyl group;

Y represents an alkyl group;

Y 1 and Y 2 may be the same or different and each represents an alkyl group, an aryl group, an aralkyl group, or a hetero atom-containing aromatic group;

R 1 and R 2 may be bonded to each other to form a ring;

R 2 and Y may be bonded to each other to form a ring;

Y 1 and Y 2 may be bonded to each other to form a ring;

two or more structures of the general formula (I) may be bonded to each other at any position of R 1 , R 2 or Y, or Y 1 or Y 2 via a connecting group; and

X − represents a non-nucleophilic anion.