Method for coating metal surfaces and substrate having a coated metal surface
A process for producing a coated substrate or a product having a coated substrate is provided. The process includes coating at least one metallic surface with a glass, the substrate being coated with an evaporation-coating glass at least on the metallic surface.
1. A process for producing a coated substrate having a metallic surface, comprising:
producing at least one negatively structured first coating on the metallic surface;
depositing a borosilicate glass comprising aluminum oxide and alkali metal oxide components as an hermetic evaporation-coating glass layer on the first coating;
at least partially removing the at least one negatively structured first coating and the hermetic evaporation-coating glass layer thereon, wherein the hermetic evaporation-coating glass layer is deposited with a thickness that is less than the thickness of the negatively structured first coating, and whereby the first coating remains accessible at side edges of structures of the negatively structured first coating after deposition of the hermetic evaporation-coating glass; and
at least partially uncovering the at least one negatively structured first coating.
2. The process as claimed in claim 1 , wherein the hermetic evaporation-coating glass layer is deposited by electron beam evaporation.
3. The process as claimed in claim 1 , wherein the step of producing the at least one negatively structured first coating on the metallic surface comprises the step of uncovering regions of the metallic surface that are to be coated.
4. The process as claimed in claim 1 , wherein the step of producing the at least one negatively structured first coating comprises the step of resist-coating or printing.
5. The process as claimed in claim 1 , wherein the step of at least partially removing the at least one negatively structured first coating comprises the step of lifting off regions of the hermetic evaporation-coating glass layer.
6. The process as claimed in claim 1 , wherein the step of at least partially uncovering the at least one negatively structured first coating comprises the step of planarizing the metallic surface having the at least one negatively structured first coating and the hermetic evaporation-coating glass layer thereon.
7. The process as claimed in claim 1 , wherein the step of partially uncovering the at least one negatively structured first coating comprises the step of mechanically removing material by a process selected from the group consisting of grinding, lapping, and polishing.
8. The process as claimed in claim 1 , wherein depositing the hermetic evaporation-coating glass layer comprises evaporation coating through a mask.
9. The process as claimed in claim 1 , further comprising depositing at least two hermetic evaporation-coating glass layers on the metallic substrate.
10. The process as claimed in claim 9 , wherein the at least two evaporation-coating glass layers comprise different compositions.
11. The process as claimed in claim 1 , wherein the hermetic evaporation-coating glass layer is deposited with a thickness in a range from 0.01 μm to 1 mm.
12. The process as claimed in claim 1 , wherein the hermetic evaporation-coating glass layer has a composition that is varied while being deposited.
13. The process as claimed in claim 1 , wherein depositing the hermetic evaporation-coating glass layer comprises co-evaporating evaporation-coating material from at least two sources.
14. The process as claimed in claim 1 , further comprising heating the metallic substrate during deposition of the hermetic evaporation-coating glass layer.
15. The process as claimed in claim 1 , wherein depositing the hermetic evaporation-coating glass layer occurs at a pressure that is at most 10 −4 mbar.
16. The process as claimed in claim 1 , further comprising structuring the hermetic evaporation-coating glass layer following the depositing operation.
17. The process as claimed in claim 16 , wherein structuring the hermetic evaporation-coating glass layer comprises local etching.
18. The process as claimed in claim 1 , further comprising moving the metallic substrate with respect to a coating source during the depositing step.
19. The process as claimed in claim 1 , wherein depositing the hermetic evaporation-coating glass layer comprises plasma ion assisted deposition (PIAD).
20. A process for producing a coated substrate, comprising:
producing a negatively structured first coating on a metallic surface of a solid metal substrate;
depositing a borosilicate glass comprising aluminum oxide and alkali metal oxide components as an hermetic evaporation-coating glass layer on the negatively structured first coating;
at least partially removing the negatively structured first coating and the hermetic evaporation-coating glass layer thereon, wherein the hermetic evaporation-coating glass layer is deposited with a thickness that is less than the thickness of the negatively structured first coating, and whereby the first coating remains accessible at side edges of structures of the negatively structured first coating after deposition of the hermetic evaporation-coating glass layer; and
at least partially uncovering the negatively structured first coating.
21. The process as claimed in claim 20 , wherein the step of producing the negatively structured first coating on the metallic surface comprises the step of uncovering regions of the metallic surface that are to be coated with the hermetic evaporation-coating glass layer.
22. The process as claimed in claim 20 , wherein the step of at least partially removing the negatively structured first coating comprises the step of lifting off regions of the hermetic evaporation-coating glass layer.