IP Library › Granted Patent US 7,374,818
Granted Patent B2
US 7,374,818 · App. 11/135,857 · Granted May 20, 2008

Coating system for silicon based substrates

Assignee: United Technologies Corporation
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Quick Facts
Patent No.
US 7,374,818
App. No.
11/135,857
Granted
May 20, 2008
Kind
B2
Abstract

A bond coat system for silicon based substrates wherein a compliant layer having an elastic modulus of between 30 and 130 GPa is provided between the silicon based substrate and a silicon metal containing oxygen gettering layer.

Claims (20)

1. An article comprising:

a silicon based substrate;

an oxygen gettering layer;

a layer between the silicon based substrate and the oxygen gettering layer, wherein the layer has an elastic modulus of between 30 and 130 GPa and is selected from the group consisting of alkaline earth alumino silicates, yttrium monosilicate, yttrium disilicate, rare earth mono and disilicates, hafnium silicate, zirconium silicate; oxides of hafnium, zirconium, yttrium, rare earth metals, niobium, titanium, tantalum, silicon, aluminum; silicon nitride; silicon carbide; silicon oxynitrides; silicon oxy carbides; silicon oxycarbonitrides; silicon refractory metal oxides; alumina forming refractory metal alloys; chromia forming refractory metal alloys; and mixtures thereof; and

an environmental barrier coating (EBC) on the oxygen gettering layer.

2. An article according to claim 1 , wherein the oxygen gettering layer is selected from the group consisting of silicon metal, silicon metal alloys, intermetallic silicides, chromia forming metallic alloys, alumina forming metallic alloys, and mixtures thereof.

3. An article according to claim 1 or 2 , wherein the layer has a porosity of about 2 to 50%.

4. An article according to claim 1 or 2 , wherein the layer has a thickness of between 20 and 250 microns.

5. An article according to claim 1 or 2 , wherein the layer and the oxygen gettering layer have a ratio of thickness of complaint layer to gettering layer of about 0.1:1 and 10:1.

6. An article according to claim 5 , wherein the layer has a thickness of between 40 and 125 microns.

7. An article according to claim 6 , wherein the layer has a porosity of about 5 to 25%.

8. An article according to claim 1 , wherein the layer is selected from the group consisting of yttrium oxide, hafnium oxide, rare earth metal oxides, yttrium monosilicate, yttrium disilicate, rare earth mono and disilicates, hafnium silicate, and mixtures thereof.

9. An article according to claim 1 or 2 , wherein the silicon based substrate is selected from the group consisting of monolithic silicon nitride, monolithic silicon carbide, silicon nitride containing composites, silicon carbide containing composites, silicon oxynitrides, silicon carbonitrides, silicon oxycarbides, molybdenum alloys containing silicon, and niobium alloys containing silicon.

10. An article according to claim 1 or 2 , wherein the EBC comprises at least one layer selected from the group consisting of mullite, alkaline earth aluminosilicates, barium strontium aluminosilicate, yttrium silicates, rare earth silicates, hafnium oxide, zirconium oxide, titanium oxide, silicon oxide, yttrium oxide, rare earth metal oxides, tantalum oxide, niobium oxide, aluminum oxide, and mixtures thereof.

11. An article according to claim 10 , wherein the EBC comprises a plurality of layers.

12. The article according to claim 1 or 2 , wherein the layer and oxygen gettering layer are repeated at least once.

13. The article according to claim 1 or 2 , wherein the EBC coating is on substantially all of the oxygen gettering layer.

14. The article according to claim 1 or 2 , wherein the coated silicon based substrate, with the oxygen gettering layer and the layer therebetween that retains at least 70% of its original substrate strength.

15. A method of making the article according to claim 1 or 2 , wherein at least one of the layer, oxygen gettering layer and the EBC is deposited using thermal spraying, chemical vapor deposition, physical vapor deposition, electrophoretic deposition, electrostatic deposition, preceramic polymer pyrolysis, sol-gel, slurry coating, dipping, air-brushing, sputtering, slurry painting or any combination thereof.

16. A method of making the article according to claim 1 , wherein at least one sacrificial pore former is used to control the porosity and thereby modulus of the layer.

Assignments (5)
CHANGE OF NAME Recorded Jul 27, 2023
From: RAYTHEON TECHNOLOGIES CORPORATION
To: RTX CORPORATION
Reel/Frame 064714/0001 →
CORRECTIVE ASSIGNMENT TO CORRECT THE AND REMOVE PATENT APPLICATION NUMBER 11886281 AND ADD PATENT APPLICATION NUMBER 14846874. TO CORRECT THE RECEIVING PARTY ADDRESS PREVIOUSLY RECORDED AT REEL: 054062 FRAME: 0001. ASSIGNOR(S) HEREBY CONFIRMS THE CHANGE OF ADDRESS. Recorded Mar 4, 2021
From: UNITED TECHNOLOGIES CORPORATION
To: RAYTHEON TECHNOLOGIES CORPORATION
Reel/Frame 055659/0001 →
CHANGE OF NAME Recorded Sep 4, 2020
From: UNITED TECHNOLOGIES CORPORATION
To: RAYTHEON TECHNOLOGIES CORPORATION
Reel/Frame 054062/0001 →
CONFIRMATORY LICENSE Recorded Jan 27, 2009
From: UNITED TECHNOLOGIES CORPORATION
To: NAVY, SECRETARY OF THE, UNITED STATES OF AMERICA
Reel/Frame 022180/0883 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded May 23, 2005
From: BHATIA, TANIA; SCHMIDT, WAYDE R.; TREDWAY, WILLIAM K.; VEDULA, VENKATA
To: UNITED TECHNOLOGIES CORPORATION
Reel/Frame 016597/0467 →
Continuity (1)
Related Publication 20070014996A1 · Jan 18, 2007