Structured anode X-ray source for X-ray microscopy
An x-ray source comprises a structured anode that has a thin top layer made of the desired target material and a thick bottom layer made of low atomic number and low density materials with good thermal properties. In one example, the anode comprises a layer of copper with an optimal thickness deposited on a layer of beryllium or diamond substrate. This structured target design allows for the use of efficient high energy electrons for generation of characteristic x-rays per unit energy deposited in the top layer and the use of the bottom layer as a thermal sink. This anode design can be applied to substantially increase the brightness of stationary, rotating anode or other electron bombardment-based sources where brightness is defined as number of x-rays per unit area and unit solid angle emitted by a source and is a key figure of merit parameter for a source.
1. An x-ray source comprising:
an electron source for generating an electron beam;
an anode, at which the electron beam is directed to produce x-rays, the anode comprising a layer of a metal on a substrate, the metal layer being less than 8 micrometers thick;
a monochromator for suppressing Bremsstrahlung radiation in the x-rays relative to x-ray radiation of a characteristic line of the metal; and
a central stop for spatially filtering the x-rays.
2. An x-ray source as claimed in claim 1 , wherein the metal layer of the anode is thin, being less than 3-5 micrometers thick.
3. An x-ray source as claimed in claim 1 , wherein the metal layer comprises copper.
4. An x-ray source as claimed in claim 1 , wherein the metal layer comprises chromium, tungsten, platinum, or gold.
5. An x-ray source as claimed in claim 1 , wherein the substrate comprises beryllium.
6. An x-ray source as claimed in claim 1 , wherein the substrate comprises carbon.
7. An x-ray source as claimed in claim 1 , wherein the substrate comprises diamond.
8. An x-ray source as claimed in claim 1 , further comprising a barrier layer between the metal layer and the substrate.
9. An x-ray source as claimed in claim 1 , wherein a thickness of the metal layer is selected based on an acceleration voltage of the electron beam such that electrons lose only about 5-15% of their energy in the metal layer.
10. An x-ray source as claimed in claim 1 , wherein an energy of the electron beam more than 8 times an atomic shell ionization energy of the metal layer.
11. An x-ray source as claimed in claim 1 , wherein an energy of the electron beam about 15 times an atomic shell ionization energy of the metal layer, or more.
12. An x-ray source as claimed in claim 1 , further comprising a pin hole aperture.
13. An x-ray source as claimed in claim 1 , wherein the x-rays are collected at a take-off angle of 6-45 degree relative to the layer of the metal.
14. An x-ray source as claimed in claim 1 , wherein a focal spot size of the electron beam on the metal layer is less than 5 micrometers.
15. A method for generating x-rays, comprising:
generating an electron beam;
directing the electron beam at a metal layer to generate x-rays, the metal layer being less than 8 micrometers thick;
filtering the x-rays to suppress Bremsstrahlung radiation relative to x-ray radiation of a characteristic line of the metal; and
spatially filtering the x-rays with a central stop.
16. A method as claimed in claim 15 , wherein the metal layer is less than 3 micrometers thick.
17. A method as claimed in claim 15 , wherein an energy of the electron beam is more than 8 times an atomic shell ionization energy of the metal layer.
18. A method as claimed in claim 15 , wherein an energy of the electron beam is about 15 times an atomic shell ionization energy of the metal layer, or more.
19. A method as claimed in claim 15 , wherein the step of filtering comprises using a monochromator.
20. A method as claimed in claim 15 , further comprising spatially filtering the x-rays with a pin hole aperture.
21. A method as claimed in claim 15 , further comprising collecting the x-rays at a take-off angle of 6-45 degree relative to the layer of the metal.
22. A method as claimed in claim 15 , wherein a focal spot size of the electron beam on the metal layer is less than 5 micrometers.